Optical design is a key technology for innovations in medical and biotechnology, automotive applications, industrial manufacturing, mechanical engineering, space technology, lithography and consumer applications.

Optical systems become more and more complex with increased functionality and further specific optimization. This trend results in a growing demand for the qualification and competence of optical designers. In addition to the basic seminar „Optische Systeme: Design und Simulation“, Photonics BW offers the seminar „Advanced Lens Design“ for extending and deepening the knowledge in lens design.

Note: This event is planned as a ClusterXChange within the Photonics4Industry project. Participants from outside Germany may check their eligibility here.


  • The seminar combines theoretical knowledge about optical design for imaging systems with the transfer into practical solutions. The participants improve their knowledge and will be qualified for a broad range of challenging applications in lens design.
  • Intensive coaching and assistance by the lecturing team.

Target Group

The target groups are engineers, physicists, technicians, project manager and scientists with basic knowledge in optical design and the application of the software OpticStudio.

The seminar is limited to a maximum of 20 participants. For a successful participation, you should bring your laptop with an installed license of OpticStudio (version 2017 or newer). If you need a time-limited license during the seminar, please inform Photonics BW by mail at: info [at] photonicsbw.de (info(at)photonicsbw.de)

Theory und Methods

  • Advanced aberration theory: Higher orders, induced aberrations, sine condition, pupil aberrations, isoplanatism
  • Optimization and correction: Method of optimization, special approaches for correction, global algorithms, glass selection, structural changes, stop position, field lenses
  • Chromatical correction: Achromatization, special achromates, apochromatic systems, spherochromatism, lateral chromatical aberrations, new achromate, dialyte and Schupman lenses
  • Correction methods: Lens bending and splitting, aplanatic surfaces, AC lenses, symmetry, wide angle approaches, sensitivity
  • Field flatness: Petzval theorem, correction of image flatness
  • Tolerancing: Types of tolerances, Monte-Carlo simulation, realistic quality estimation, tolerancing aspheres, thermal degradation

Special Components

  • Aspheres: Types of surface description, Forbes aspheres, spherical correction, optimal location of aspheres
  • Freeforms: Motivation, representation of surfaces, optimization, aberrations and quality assessment, aspects of realization
  • Diffractive elements: Diffraction and efficiency, modelling approaches, aberrations and correction, false light

Selected Applications

  • Simple systems: 4f systems, relays, endoscopes, eyepieces, scan lenses
  • Microscopic systems: Principle, objective lenses, tube optics, confocal systems, illumination aspects, stereo microscopes
  • Photographic systems: Overview, classification, system types, special features
  • Mirror systems: Basic properties, telescopes, freeform solutions

For more information, please see our flyer.

We look forward to your binding registration by mail to info [at] photonicsbw.de (info(at)photonicsbw.de)

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